The good electro-optical properties of Cu2O make it used as photocatalyst in degradation of organic pollutants and H2 evolution from photoelectrolysis of water under visible light illumination [7–9]. By far, many deposited methods have been investigated to prepare Cu2O thin films, such as sputtering [10, 11], thermal oxidation [12], chemical vapor deposition [13], anodic oxidation [14], spray pyrolysis

[15, 16], chemical oxidation [17], electrodeposition [18, 19], and so on. Among these techniques, electrodeposition is an inexpensive, convenient, and effective way to prepare semiconductor oxide films over conductive substrates. The surface morphology and physical properties of the electrodeposition-derived films is mainly determined by deposition parameters such as applied potential, concentration of electrolyte, bath temperature, click here and bath pH [20–23]. Yao et al. [24] reported the electrochemical deposition of Cu2O microcrystals on a glassy carbon (GC) electrode. When varying the deposition voltage at GC electrode, Cu2O nanocrystalline changed from superoctahedral to octahedron and then to microspheres. Jiang et al. [25] studied electronic structure of Cu2O thin films grown on Cu (110) by X-ray absorption spectroscopy (XAS) and X-ray photoelectron spectroscopy (XPS). Combined with XAS and XPS measurements,

accurate identification of the various chemical components has been determined. According to these observations, it can be concluded that the deposition conditions play an important KU55933 role in the physical properties of Cu2O thin films. And they also explained about the effect of deposition conditions on the microstructure and optical properties of Cu2O films. Recently, the electrodeposited Cu2O films prepared using potentiostatic method

and physical properties of the as-deposited Cu2O films have been reported. In this paper, Cu2O thin films were deposited by electrodeposition at different applied potentials. The effect of the applied potential on the morphological, microstructural, and optical properties of the as-deposited Cu2O films has been investigated in detail. Methods Preparation of Cu2O thin films The Cu2O thin films were prepared by electrodeposition on Ti sheets. Prior to the deposition, Ti sheets were ultrasonically cleaned in acetone, alcohol, and deionized water, sequentially. Then, they were chemically learn more polished Bcl-w by immersing them in a mixture of HF and HNO3 acids (HF:HNO3:H2O = 1:1:2 in volume) for 20 s, followed by rinsing in deionized water. Electrodeposition of Cu2O was performed using a three-electrode system, in which a Ti sheet was used as a working electrode. A Pt plate and an Ag/AgCl in saturated potassium chloride aqueous solution were employed as counter and reference electrode. Cu2O films were grown on the surface of Ti sheets at bath temperature of 40°C using a solution consisting of 0.1 M sodium acetate (NaCH3COO) and 0.05 M cupric acetate (Cu(CH3COO)2).